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溅射功率和气压对直流磁控溅射制备钨薄膜的影响

Translated title of the contribution: Influence of Sputtering Power and Gas Pressure on the Preparation of Tungsten Films by DC Magnetron Sputtering
  • 邢晓帅
  • , 刘影夏
  • , 于晓东
  • , 程荆卫
  • , 赵修臣
  • , 聂志华
  • , 谭成文*
    • *Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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