Rapid Nanoscale Patterning by Soft Polymer Masks for Enhanced Patterned Sapphire Substrates (PSS) in LED Manufacturing

Project: Research

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Nowadays, LEDs have been adopted as a standard light source for a wide range of products from general lighting all the way to backlighting for consumer electronics involving HDTVs and others. However, LED performance and cost still hinders the further deployment of LEDs for the consumer acceptance. Currently, manufacturers are investigating to pattern sapphire LED-substrates to maximize light extraction and tackle issues to broader LED usage. Wafer vendors have begun to put periodic nanostructures on sapphires by reactive ion etching with patterned photoresist (PR) mask on top of substrates, which are known as patterned sapphire substrates (PSS). In this regard, creating accurate and uniform high-precision nanostructures in the PR mask with low-cost and high-throughput process is essential but still a challenge for the PSS fabrication. In this project, we propose to develop reusable, rapid and large-scale nanoscale patterning technique on sapphire substrates for enhanced PSS manufacturing. Our preliminary study has shown that regular nanoarrays of various shapes including cone, pillar and pencil, etc have been successfully patterned on crystalline substrates like Si by flood UV illumination with soft polymer masks. Considering this unique patterning technique, PSS can be potentially achieved with reduced cost and enhanced throughput for improved LED technologies.


Project number9440149
Grant typeITF
Effective start/end date1/06/1631/03/18