Plasma Immersion Ion Implantation and Deposition (PIII&D) Equipment

Project: Research

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Plasma immersion ion implantation and deposition (PIII&D) is a versatile technique in the modification of surface properties of materials and industrial components. We designed and built the 1st generation PIII&D equipment in our Plasma Laboratory at City University of Hong Kong in 1996. As well as being the only laboratory of this kind in Hong Kong, our Plasma Laboratory has emerged as one of the most productive and reputable plasma research laboratories in the world. Over 400 international and local researchers from about 80 universities, institutions, and companies have used our facilities, and more than 40 research projects have been supported.However, this heavy use over the past 10 years has led to significant wear and tear, and many of the components on the instrument have become obsolete. A new and up-to-date PIII&D machine has been funded to replace the old instrument. The new machine will be designed and built based on the latest technologies and on our equipment building experience. By incorporating state-of-the-art technologies, we will enable our research staff, research collaborators, and local and international users to continue to perform cutting-edge research in the years to come.


Project number8730024
Grant typeCRF
Effective start/end date1/02/0720/05/10