Prof. Stella W. PANG (彭慧芝)

Ph.D. Princeton, IEEE, AVS, and ECS Fellow

Visiting address
YEUNG-G6309
Phone: +852 34427838

Author IDs

Willing to take PhD students: yes

Qualifications/Experiences

Education

1981

Ph.D, Department of Electrical Engineering and Computer Science, Princeton University, Princeton, NJ, USA

1978

M.Sc., Electrical Engineering and Computer Science, Princeton University, Princeton, NJ, USA

1977

B.Sc., Electrical and Computer Engineering, Brown University, Providence, RI, USA

Professional Experience

2016 - PresentDepartment Head of Electronic Engineering, City University of Hong Kong Hong Kong

2012 - Present

Chair Professor of Electronic Engineering Department of Electronic Engineering Centre Director Centre for Biosystems, Neuroscience, and Nanotechnology (CBNN) City University of Hong Kong Hong Kong

1990 - 2011

Professor of Electrical Engineering and Computer Science Department of Electrical Engineering and Computer Science University of Michigan Ann Arbor, MI, USA

2002 - 2007

Associate Dean College of Engineering University of Michigan Ann Arbor, MI, USA

1981 - 1989

Technical Staff member Lincoln Laboratory Massachusetts Institute of Technology Lexington, MA, USA

Professional Affiliations

  • Fellow of Institute of Electrical and Electronics Engineering (IEEE)
  • Fellow of American Vacuum Society (AVS)
  • Fellow of Electrochemical Society (ECS)

Research Interests/Areas

  • Nanofabrication Technology
  • Nanoimprint
  • Biomedical, Microelectronic, Optical, and Microelectromechanical Devices & Microsystems

Synergistic Activities

   

  • Research interests include Nanofabrication Technology, Nanoimprint, Biomedical, Microelectronic, Optical, and Microelectromechanical Devices & Microsystems
  • Develop novel 3D nanofabrication technology for high performance electrical, optical, sensing, and biomedical devices
  • Design and generate 3D platforms to control cell migration
  • Implement high sensitivity plasmonic biosensors
  • Develop microfluidic system with nanochannels for cell and DNA analysis
  • Develop high aspect ratio micro-electromechanical system (MEMS) technology with merged circuits for high frequency resonators and high sensitivity micro gas chromatography
  • Editor for 16 books, journals, and proceedings
  • Instructor of 32 short courses for working engineers and technical staff covering topics of micro/nanofabrication technology and MEMS in US, Europe, and Asia
  • 9 US patents granted in nanotechnology (etching, planarization, and nanoimprint technology) and microsystems (MEMS and circuit integration, high aspect ratio sensors)

Research team

(From Top to Bottom, Left to Right)
Sean Lin, Sandy Zhou, Madi Rezaei, Jianan Hui
Peter Xu, Steven Zhu, Jiaqi Wang
Xi Chen, Janet Chung, Stella Pang, Aeris Lee 

Patents

     

  1. Y. P. Kong, H. Y. Low, S. W. Pang, and A. F. Yee, "Imprinting of Supported and Free-Standing 3D Micro- or Nano-Structures", U. S. Patent No. 8,025,831, September 2011.
  2. L. Tan, Y. P. Kong, S. W. Pang, and A. F. Yee, "Imprint Polymer on Patterned Substrate", U. S. Patent No. 7,618,510, November 2009.
  3. X. D. Huang, L.-R. Bao, X. Cheng, L. J. Guo, S. W. Pang, and A. F. Yee, "Reversal Imprint Technique”, International Patent PCT109217, May 2006.
  4. W. –C. Tian, S. W. Pang, and E. T. Zellers, "High Aspect Ratio Microheater for a Micro Analytical System”, U. S. Patent No. 6,914,220, July 2005.
  5. L.-R. Bao, L. Tan, X. D. Huang, Y. P. Kong, L. J. Guo, S. W. Pang, and A. F. Yee, "Methods of Creating Patterns on Substrates and Articles of Manufacture Resulting Therefrom”, U. S. Patent No. 6,860,956, March 2005.
  6. J. W. Weigold and S. W. Pang, "Method of Making a Micromechanical Device from a Single Crystal Semiconductor Substrate and Monolithic Sensor Formed Thereby - Applications”, U. S. Patent No. 6,429,458, August 2002.
  7. J. W. Weigold and S. W. Pang, "Method of Making a Micromechanical Device from a Single Crystal Semiconductor Substrate and Monolithic Sensor Formed Thereby - Technology”, U. S. Patent No. 6,136,630, October 2000.
  8. S. W. Pang and M. W. Horn, "Process for Forming Planarized Films", U. S. Patent No. 5,017,403, May 1991.
  9. M. W. Geis, N. N. Efremow, and S. W. Pang, "Dry Etching Patterning of Electrical and Optical Materials", U. S. Patent No. 4,734,152, March 1988.