Dr. TAN Chaoliang (譚超良)

Visiting address
YEUNG-G6404
Phone: +852 34429405

Author IDs

Willing to take PhD students: yes

Biography

Dr. Tan is an Assistant Professor in the Department of Electrical Engineering at City University of Hong Kong. He received his PhD degree in Materials Science from Nanyang Technological University (Singapore) in 2016. After working as a Research Fellow in the same place for about one year, then he worked as a Postdoc Research Fellow in Department of Electrical Engineering and Computer Sciences at University of California, Berkeley for two years. His current research is focusing on design, synthesis and characterization of semiconductors (2D materials or thin films) for next-generation of wafer-scale electronics (transistors and circuits) and optoelectronics (infrared photodetectors and imaging sensor systems). He is also interested in other fields especially engineering of layered materials and demonstration of their various applications in energy storage and biomedicine. He has authored or co-authored over 120 SCI papers. More than 40 of them are first author or corresponding author papers, including Nat. Nanotechnol.Nat. Rev. Mater.Chem. Rev.Chem. Soc. Rev.Nat. Commun.J. Am. Chem. Soc.Angew. Chem. Int. Ed.Adv. Mater.ACS Nano and Small. The total citation of his published papers is over 17,700 with a H-index of 58. He has been listed as the "Highly Cited Researcher" (top 1%; by Clarivate Analytics) in last three years including 2018, 2019 and 2020 as well as “Top 2% Scientists in the world” in Engineering by Stanford Unviersity in 2020.