半导体学报

半导体学报

ISSNs: 0253-4177

中国科技出版传媒股份有限公司, China

Journal

Journal Metrics
1 - 14 out of 14Page size: 20

Research Output

  1. 2007
  2. Published

    ZnO/p-Si 异质结构的电学输运特性

    顾启琳, 陈旭东, 凌志聪, 梅永丰, 傅劲裕, 萧季驹 & 朱剑豪, Sept 2007, In: 半导体学报. 28, SUPPL. 1, p. 149-152

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib
  3. 2006
  4. Published

    改进型 Ge 浓缩技术制备 SGOI 及其机理

    张苗, 狄增峰, 刘卫丽, 骆苏华, 宋志棠, 朱剑豪 & 林成鲁, Dec 2006, In: 半导体学报. 27, SUPPL. 1, p. 252-256

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib
  5. 2003
  6. Published

    Co/C/Si(100) 结构固相外延生长 CoSi2

    屈新萍, 徐蓓蕾, 茹国平, 李炳宗, Cheung, W. Y., Wong, S. P. & Chu, P. K., Jan 2003, In: 半导体学报. 24, 1, p. 63-67

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 1
    Check@CityULib
  7. 2001
  8. Published

    SiOx 调制的三元硅化物 (Co1-xNix) Si2 外延

    韩永召, 李炳宗, 茹国平, 屈新萍, 曹永峰, 徐蓓蕾 , 蒋玉龙, & 3 others王连卫, 张荣耀 & 朱剑豪, Oct 2001, In: 半导体学报. 22, 10, p. 1269-1273

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 1
    Check@CityULib
  9. 1999
  10. Published

    硅中氦离子注入所产生的微孔结构的吸杂作用

    闵靖, 朱剑豪, 吕翔, Iyer, S. S. K. & Cheung, N. W., Jun 1999, In: 半导体学报. 20, 6, p. 448-451

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib
  11. 1998
  12. Published

    Co/Si/Ti/Si(100) 多层薄膜固相反应异质外延生长 CoSi2 薄膜

    屈新萍, 李炳宗, 茹国平, 顾志光, 徐鸿涛, 莫鸿翔, 刘京, & 1 others朱剑豪, Sept 1998, In: 半导体学报. 19, 9, p. 641-645

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib
  13. Published

    TiN 覆盖层和 Co/Ti/Si 三元固相反应改善超薄 CoSi2 高温稳定性

    刘京, 茹国平, 顾志光, 屈新萍, 李炳宗 & 朱剑豪, Mar 1998, In: 半导体学报. 19, 3, p. 214-217

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 1
    Check@CityULib
  14. 1995

  15. H 原子吸附对 Si(113) 表面的影响

    张瑞勤, 吴汲安 & 邢益荣, Nov 1995, In: 半导体学报. 16, 11, p. 815-819

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib

  16. 水分子在 Si(100) 面上吸附位的确定

    张瑞勤, 楚天舒, 戴国才, 吴汲安 & 邢益荣, Nov 1995, In: 半导体学报. 16, 11, p. 820-825

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib

  17. 硅离子簇的理论研究

    楚天舒, 张瑞勤 & 戴国才, Nov 1995, In: 半导体学报. 16, 11, p. 805-810

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib

  18. 硼掺杂及未掺杂金刚石薄膜的电学和光电导特性

    张仿清, 张文军, 胡博, 谢二庆 & 陈光华, Oct 1995, In: 半导体学报. 16, 10, p. 783-788

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 2
    Check@CityULib
  19. Published

    形成 SIMOX 结构的 PIII 新技术的研究

    闵靖, Chu, P. K., Cheng, Y. C., Liu, J. B., Iyer, S. & Cheng, N. W., Aug 1995, In: 半导体学报. 16, 8, p. 636-640

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 3
    Check@CityULib
  20. 1993

  21. Si (112) 高密勒指数面的理论研究

    张瑞勤, 吴汲安 & 邢益荣, Sept 1993, In: 半导体学报. 14, 9, p. 527-533

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib
  22. 1989

  23. Si(113)表面电子结构的研究

    张瑞勤, 王家俭, 戴国才, 吴汲安, 张敬平 & 邢益荣, Sept 1989, In: 半导体学报. 10, 9, p. 645-652

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Check@CityULib