Materials Science and Engineering: R: Reports
Materials Science and Engineering: R: Reports
ISSNs: 0927-796X
Elsevier BV, Netherlands
Scopus rating (2021): CiteScore 43 SJR 6.443 SNIP 6.593
Journal
Research Output
- 1996
- Published
Plasma immersion ion implantation - A fledgling technique for semiconductor processing
Chu, P. K., Qin, S., Chan, C., Cheung, N. W. & Larson, L. A., 30 Nov 1996, In: Materials Science and Engineering R: Reports. 17, 6-7, p. 207-280Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 62_Review of books or of software (or similar publications/items) › peer-review
Scopus citations: 362