Journal of Vacuum Science and Technology A

Journal of Vacuum Science and Technology A

ISSNs: 0734-2101

Additional searchable ISSN (Electronic): 1520-8559

AVS Science and Technology Society, United States

Scopus rating (2021): CiteScore 4.4 SJR 0.676 SNIP 0.992

Journal

Journal Metrics
61 - 76 out of 76Page size: 20

Research Output

  1. 1995

  2. High-aspect-ratio Si etching for microsensor fabrication

    Juan, W. H. & Pang, S. W., May 1995, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 13, 3, p. 834-838

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 33
    Check@CityULib

  3. Initial growth of ultrathin Pd films on Cu(001)

    Yao, J., Shen, Y. G., O’Connor, D. J. & Kinag, B. V., May 1995, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 13, 3, p. 1443-1447

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 13
    Check@CityULib

  4. Monitoring InP and GaAs etched in Cl2/Ar using optical emission spectroscopy and mass spectrometry

    Thomas III, S., Ko, K. K. & Pang, S. W., May 1995, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 13, 3, p. 894-899

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 48
    Check@CityULib

  5. Structural study of the growth of thin Cu films on Ru(0001) by low-energy alkali ion scattering

    Shen, Y. G., O’Connor, D. J., Yao, J., Van Zee, H., Roberts, R. H. & MacDonald, R. J., May 1995, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 13, 3, p. 1478-1483

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 9
    Check@CityULib
  6. 1994

  7. Characterization of etch-induced damage for Si etched in Cl2 plasma generated by an electron cyclotron resonance source Plasma Generated by an Electron Cyclotron Resonance Source

    Sung, K. T. & Pang, S. W., Jul 1994, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 12, 4, p. 1346-1350

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 10
    Check@CityULib

  8. Dependence of etch characteristics on charge particles as measured by Langmuir probe in a multipolar electron cyclotron resonance source

    Sung, K. T., Juan, W. H. & Pang, S. W., Jan 1994, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 12, 1, p. 69-74

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 16
    Check@CityULib
  9. 1993

  10. Etching of Si with Cl2 using an Electron Cyclotron Resonance Source

    Sung, K. T. & Pang, S. W., Jul 1993, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 11, 4, p. 1206-1210

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 25
    Check@CityULib

  11. Interaction of Molecular BF+ and BFJ ions with Gold Surfaces at Low Energies: Neutralization, Dissociation, and Deposition

    Shen, Y. G., Huang, L. J. & Lau, W. M., Jul 1993, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 11, 4, p. 2099-2103

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 9
    Check@CityULib
  12. 1990

  13. Aluminum-samarium alloy for interconnections in integrated circuits

    Gardner, D., Hu, H. S., Mardinly, A. J. & Nieh, T. G., May 1990, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 8, 3, p. 1480-1483

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 5
    Check@CityULib
  14. 1989

  15. The effect of vapor incidence angle upon thin-film columnar growth

    Mazor, A., Bukiet, B. G. & Srolovitz, D. J., May 1989, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 7, 3, p. 1386-1391

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 24
    Check@CityULib
  16. 1988

  17. Analytical and numerical modeling of columnar evolution in thin films

    Srolovitz, D. J., Mazor, A. & Bukiet, B. G., Jul 1988, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 6, 4, p. 2371-2380

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 109
    Check@CityULib

  18. Summary Abstract: Theory and simulations of zone II microstructures in thin films

    Srolovitz, D. J., Mazor, A., Bukiet, B. G. & Hagan, P. S., May 1988, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 6, 3, p. 1640-1641

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › Meeting abstract › peer-review

    Check@CityULib
  19. 1987

  20. Erratum: Application of glow discharge mass spectrometry and sputtered neutral mass spectrometry to materials characterization [J. Vac. Sci. Technol. A 5, 295(1987)]

    Chu, P. K., Huneke, J. C. & Blattner, R. J., Sep 1987, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 5, 5

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › Erratum

    Check@CityULib

  21. Application of glow discharge mass spectrometry and sputtered neutral mass spectrometry to materials characterization

    Chu, P. K., Huneke, J. C. & Blattner, R. J., May 1987, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 5, 3, p. 295-301

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 24
    Check@CityULib
  22. 1986

  23. Grain growth phenomena in films: A Monte Carlo approach

    Srolovitz, D. J., Nov 1986, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 4, 6, p. 2925-2931

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 103
    Check@CityULib
  24. 1984

  25. Summary Abstract: Current metallization issues in microelectronic devices

    Tu, K. N., Apr 1984, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2, 2, p. 216-217

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 2
    Check@CityULib
Previous 1 2 3 4 Next