Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Journal

Journal Metrics

Research Output

  1. 1999
  2. Characterization of bending in single crystal Si beams and resonators

    Weigold, J. W., Juan, W. H., Pang, S. W. & Borenstein, J. T., Jul 1999, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 17, 4, p. 1336-1340

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

    Scopus citations: 3
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  3. 1995
  4. Atomic Force Microscopy Study of III-V Materials Etched Using and Electron Cyclotron Resonance Source

    Pang, S. W. & Thomas III, S., Nov 1995, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 13, 6, p. 2350-2354

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  5. Plasma passivation of etch‐induced surface damage on GaAs

    Ko, K. K. & Pang, S. W., Nov 1995, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 13, 6, p. 2376-2380

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  6. 1994
  7. Evaluation of surface damage on GaAs etched with an electron cyclotron resonance source

    Ko, K. K., Pang, S. W., Brock, T., Cole, M. W. & Casas, L. M., Nov 1994, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 12, 6, p. 3382-3387

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  8. Dependence of Contact Resistivity and Schottky Diode Characteristics on Dry Etching Induced Damage of GaInAs

    Thomas III, S. & Pang, S. W., Sep 1994, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 12, 5, p. 2941-2946

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  9. High Aspect Ratio Polyimide Etching Using an Oxygen Plasma Generated by Electron Cyclotron Resonance Source

    Juan, W. H. & Pang, S. W., Jan 1994, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 12, 1, p. 422-426

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  10. 1993
  11. Controllable Layer by Layer Etching of GaAs with an Electron Cyclotron Resonance Source

    Ko, K. K. & Pang, S. W., Nov 1993, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 11, 6, p. 2275-2279

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  12. Effects of Reactive Ion Etching on Optical and Electro-Optical Properties of GaInAs/InP Based Strip-Loaded Waveguides

    Thirstrup, C., Pang, S. W., Albrektsen, O. & Hanberg, J., Jul 1993, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 11, 4, p. 1214-1221

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  13. 1992
  14. Check@CityULib
  15. Etching of Photoresist Using Oxygen Plasma Generated by a Multipolar Electron Cyclotron Resonance Source

    Pang, S. W., Sung, K. T. & Ko, K. K., May 1992, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 10, 3, p. 1118-1123

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  16. 1991
  17. Etching of GaAs and InP Using a Hybrid Microwave and rf System

    Pang, S. W., Liu, Y. & Sung, K. T., Nov 1991, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 9, p. 3530-3534

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  18. 1990
  19. Plasma‐deposited amorphous carbon films as planarization layers

    Pang, S. W. & Horn, M. W., Nov 1990, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 8, 6, p. 1980-1984

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  20. Plasma‐deposited organosilicon thin films as dry resists for deep ultraviolet lithography

    Horn, M. W., Pang, S. W. & Rothschild, M., Nov 1990, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 8, 6, p. 1493-1496

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  21. 1989
  22. Aluminum Oxides As Imaging Materials For 193-nm Excimer Laser Lithography

    Pang, S. W., Kunz, R. R., Rothschild, M., Goodman, R. B. & Horn, M. W., Nov 1989, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 7, 6, p. 1624-1628

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  23. 1988
  24. Dry Etching Induced Damage on Vertical Sidewalls of GaAs Channels

    Pang, S. W., Goodhue, W. D., Lyszczarz, T. M., Ehrlich, D. J., Goodman, R. B. & Johnson, G. D., Nov 1988, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 6, 6, p. 1916-1920

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  25. Emerging Technology for in situ processing: Patterning Alternatives

    Ehrlich, D. J., Black, J. G., Rothschild, M. & Pang, S. W., May 1988, In: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 6, 3, p. 895

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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