Journal of the Electrochemical Society
Journal of the Electrochemical Society
ISSNs: 0013-4651
Additional searchable ISSN (electronic): 1945-7111
Electrochemical Society, Inc., United States
Scopus rating (2023): CiteScore 7.2 SJR 0.868 SNIP 0.773
Journal
Research Output
- 2006
Effect of electrode parameters on LiFePO4 cathodes
Yu, D. Y. W., Donoue, K., Inoue, T., Fujimoto, M. & Fujitani, S., 2006, In: Journal of the Electrochemical Society. 153, 5Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 119Erratum: Effect of Electrode Parameters on LiFePO4 cathodes [ J. Electrochem. Soc. , 153 , A835 (2006) ]
Yu, D. Y. W., Donoue, K., Inoue, T., Fujimoto, M. & Fujitani, S., 2006, In: Journal of the Electrochemical Society. 153, 7, p. L11Research output: Journal Publications and Reviews › Erratum
Scopus citations: 2- 2005
Investigation of Ti/IrO2-Sb2O5-SnO 2 electrodes for O2 evolution calcination temperature and precursor composition effects
Chen, X. & Chen, G., 2005, In: Journal of the Electrochemical Society. 152, 7Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 40- 2004
Electroless nickel deposition on silicone-rich polyester surfaces
Yan, Y. H., Chan-Park, M. B., Chew, C. P. & Yue, C. Y., 2004, In: Journal of the Electrochemical Society. 151, 11Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 10Methanol resistant cathodic catalyst for direct methanol fuel cells
Wang, X., Waje, M. & Yan, Y., 2004, In: Journal of the Electrochemical Society. 151, 12Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 41Proper Hot Filament CVD Conditions for Fabrication of Ti-Boron Doped Diamond Electrodes
Chen, X. & Chen, G., 2004, In: Journal of the Electrochemical Society. 151, 4Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 22- 2003
Morphological Stability during Electrodeposition: II. Additive Effects
Haataja, M., Srolovitz, D. J. & Bocarsly, A. B., Oct 2003, In: Journal of the Electrochemical Society. 150, 10, p. C708-C716Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 20Morphological Stability during Electrodeposition: I. Steady States and Stability Analysis
Haataja, M., Srolovitz, D. J. & Bocarsly, A. B., Oct 2003, In: Journal of the Electrochemical Society. 150, 10, p. C699-C707Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 20- 2002
A robust multilevel interconnect module for subquartermicrometer complementary metal oxide semiconductor technology integration
Zhang, Z., Huang, J.-S., Twiford, M., Martin, E., Layadi, N., Salah, A. & Bhowmik, B. & 4 others, , May 2002, In: Journal of the Electrochemical Society. 149, 5, p. G324-G329Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 3Displacement reactions between metal ions and nitride barrier layer/silicon substrate
Wu, Y., Chen, W. C., Fong, H. P., Wan, C. C. & Wang, Y. Y., May 2002, In: Journal of the Electrochemical Society. 149, 5Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 13Electrochemical impedance studies of methanol electro-oxidation on Pt/C thin film electrode
Hsing, I.-M., Wang, X. & Leng, Y.-J., May 2002, In: Journal of the Electrochemical Society. 149, 5Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 180Polyol electroless and electrodeposition of nanostructured Ni-Co films and powders
Blackwood, D. J., Li, Y. Y. & Chow, G. M., Mar 2002, In: Journal of the Electrochemical Society. 149, 3Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 7- 1999
Low-Pressure Etching of Nanostructures and Via Holes Using an Inductively Coupled Plasma System
Berg, E. W. & Pang, S. W., 1999, In: Journal of the Electrochemical Society. 146, 2, p. 775-779Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 25- 1998
The corrosion of Mo-Al alloys in a H2/H2S/H2O gas mixture at 800-1000°C
Kai, W. & Bai, C. Y., Jul 1998, In: Journal of the Electrochemical Society. 145, 7, p. 2265-2275Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 2Dry etching of deep Si trenches for released resonators in a Cl 2 plasma
Weigold, J. W., Juan, W. H. & Pang, S. W., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1767-1771Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 9- 1995
High aspect ratio deep via holes in InP etched using Cl2/Ar plasma
Ko, K. K. & Pang, S. W., Nov 1995, In: Journal of the Electrochemical Society. 142, 11, p. 3945-3949Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 27Electrical characterization and surface analysis of dry etch-induced damage on Si after etching in an ECR source
Sung, K. T., Pang, S. W., Cole, M. W. & Pearce, N., Jan 1995, In: Journal of the Electrochemical Society. 142, 1, p. 206-211Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 28- 1994
Determination of sub-parts per billion boron contamination in N+ Czochralski silicon substrates by SIMS
Chu, P. K., Bleiler, R. J. & Metz, J. M., Dec 1994, In: Journal of the Electrochemical Society. 141, 12, p. 3453-3456Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 3Surface damage on GaAs etched using a multipolar electron cyclotron resonance source
Ko, K. K. & Pang, S. W., Jan 1994, In: Journal of the Electrochemical Society. 141, 1, p. 255-258Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 11- 1993
Low temperature etching of silylated resist in oxygen plasma generated by an electron cyclotron resonance source
Sung, K. T., Juan, W. H., Pang, S. W. & Horn, M. W., Dec 1993, In: Journal of the Electrochemical Society. 140, 12, p. 3620-3623Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 3