Journal of the Electrochemical Society

Journal of the Electrochemical Society

ISSNs: 0013-4651

Additional searchable ISSN (electronic): 1945-7111

Electrochemical Society, Inc., United States

Scopus rating (2023): CiteScore 7.2 SJR 0.868 SNIP 0.773

Journal

Journal Metrics

Research Output

  1. 2006
  2. Effect of electrode parameters on LiFePO4 cathodes

    Yu, D. Y. W., Donoue, K., Inoue, T., Fujimoto, M. & Fujitani, S., 2006, In: Journal of the Electrochemical Society. 153, 5

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 119
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  3. Erratum: Effect of Electrode Parameters on LiFePO4 cathodes [ J. Electrochem. Soc. , 153 , A835 (2006) ]

    Yu, D. Y. W., Donoue, K., Inoue, T., Fujimoto, M. & Fujitani, S., 2006, In: Journal of the Electrochemical Society. 153, 7, p. L11

    Research output: Journal Publications and ReviewsErratum

    Scopus citations: 2
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  4. 2005
  5. Investigation of Ti/IrO2-Sb2O5-SnO 2 electrodes for O2 evolution calcination temperature and precursor composition effects

    Chen, X. & Chen, G., 2005, In: Journal of the Electrochemical Society. 152, 7

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 40
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  6. 2004
  7. Electroless nickel deposition on silicone-rich polyester surfaces

    Yan, Y. H., Chan-Park, M. B., Chew, C. P. & Yue, C. Y., 2004, In: Journal of the Electrochemical Society. 151, 11

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 10
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  8. Methanol resistant cathodic catalyst for direct methanol fuel cells

    Wang, X., Waje, M. & Yan, Y., 2004, In: Journal of the Electrochemical Society. 151, 12

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 41
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  9. Proper Hot Filament CVD Conditions for Fabrication of Ti-Boron Doped Diamond Electrodes

    Chen, X. & Chen, G., 2004, In: Journal of the Electrochemical Society. 151, 4

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 22
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  10. 2003
  11. Morphological Stability during Electrodeposition: II. Additive Effects

    Haataja, M., Srolovitz, D. J. & Bocarsly, A. B., Oct 2003, In: Journal of the Electrochemical Society. 150, 10, p. C708-C716

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 20
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  12. Morphological Stability during Electrodeposition: I. Steady States and Stability Analysis

    Haataja, M., Srolovitz, D. J. & Bocarsly, A. B., Oct 2003, In: Journal of the Electrochemical Society. 150, 10, p. C699-C707

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 20
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  13. 2002
  14. A robust multilevel interconnect module for subquartermicrometer complementary metal oxide semiconductor technology integration

    Zhang, Z., Huang, J.-S., Twiford, M., Martin, E., Layadi, N., Salah, A. & Bhowmik, B. & 4 others, Vitkavage, D., Lytle, S., Yeh, E. C. C. & Tu, K.-N., May 2002, In: Journal of the Electrochemical Society. 149, 5, p. G324-G329

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 3
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  15. Displacement reactions between metal ions and nitride barrier layer/silicon substrate

    Wu, Y., Chen, W. C., Fong, H. P., Wan, C. C. & Wang, Y. Y., May 2002, In: Journal of the Electrochemical Society. 149, 5

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 13
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  16. Electrochemical impedance studies of methanol electro-oxidation on Pt/C thin film electrode

    Hsing, I.-M., Wang, X. & Leng, Y.-J., May 2002, In: Journal of the Electrochemical Society. 149, 5

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 180
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  17. Polyol electroless and electrodeposition of nanostructured Ni-Co films and powders

    Blackwood, D. J., Li, Y. Y. & Chow, G. M., Mar 2002, In: Journal of the Electrochemical Society. 149, 3

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 7
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  18. 1999
  19. Low-Pressure Etching of Nanostructures and Via Holes Using an Inductively Coupled Plasma System

    Berg, E. W. & Pang, S. W., 1999, In: Journal of the Electrochemical Society. 146, 2, p. 775-779

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 25
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  20. 1998
  21. The corrosion of Mo-Al alloys in a H2/H2S/H2O gas mixture at 800-1000°C

    Kai, W. & Bai, C. Y., Jul 1998, In: Journal of the Electrochemical Society. 145, 7, p. 2265-2275

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 2
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  22. Dry etching of deep Si trenches for released resonators in a Cl 2 plasma

    Weigold, J. W., Juan, W. H. & Pang, S. W., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1767-1771

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 9
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  23. 1995
  24. High aspect ratio deep via holes in InP etched using Cl2/Ar plasma

    Ko, K. K. & Pang, S. W., Nov 1995, In: Journal of the Electrochemical Society. 142, 11, p. 3945-3949

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 27
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  25. Electrical characterization and surface analysis of dry etch-induced damage on Si after etching in an ECR source

    Sung, K. T., Pang, S. W., Cole, M. W. & Pearce, N., Jan 1995, In: Journal of the Electrochemical Society. 142, 1, p. 206-211

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 28
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  26. 1994
  27. Determination of sub-parts per billion boron contamination in N+ Czochralski silicon substrates by SIMS

    Chu, P. K., Bleiler, R. J. & Metz, J. M., Dec 1994, In: Journal of the Electrochemical Society. 141, 12, p. 3453-3456

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 3
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  28. Surface damage on GaAs etched using a multipolar electron cyclotron resonance source

    Ko, K. K. & Pang, S. W., Jan 1994, In: Journal of the Electrochemical Society. 141, 1, p. 255-258

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 11
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  29. 1993
  30. Low temperature etching of silylated resist in oxygen plasma generated by an electron cyclotron resonance source

    Sung, K. T., Juan, W. H., Pang, S. W. & Horn, M. W., Dec 1993, In: Journal of the Electrochemical Society. 140, 12, p. 3620-3623

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 3
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