Journal of the Electrochemical Society

Journal of the Electrochemical Society

ISSNs: 0013-4651

Additional searchable ISSN (electronic): 1945-7111

Electrochemical Society, Inc., United States

Scopus rating (2023): CiteScore 7.2 SJR 0.868 SNIP 0.773

Journal

Journal Metrics
81 - 100 out of 114Page size: 20

Research Output

  1. 2003

  2. Morphological Stability during Electrodeposition: II. Additive Effects

    Haataja, M., Srolovitz, D. J. & Bocarsly, A. B., Oct 2003, In: Journal of the Electrochemical Society. 150, 10, p. C708-C716

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 20
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  3. Morphological Stability during Electrodeposition: I. Steady States and Stability Analysis

    Haataja, M., Srolovitz, D. J. & Bocarsly, A. B., Oct 2003, In: Journal of the Electrochemical Society. 150, 10, p. C699-C707

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 20
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  4. Published

    XPS Study of the Thermal Instability of HfO2 Prepared by Hf Sputtering in Oxygen with RTA

    Zhan, N., Poon, M. C., Kok, C. W., Ng, K. L. & Wong, H., Oct 2003, In: Journal of the Electrochemical Society. 150, 10

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 81
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  5. 2002

  6. A robust multilevel interconnect module for subquartermicrometer complementary metal oxide semiconductor technology integration

    Zhang, Z., Huang, J., Twiford, M., Martin, E., Layadi, N., Salah, A., Bhowmik, B., & 4 othersVitkavage, D., Lytle, S., Yeh, E. C. C. & Tu, K., May 2002, In: Journal of the Electrochemical Society. 149, 5, p. G324-G329

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 3
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  7. Displacement reactions between metal ions and nitride barrier layer/silicon substrate

    Wu, Y., Chen, W. C., Fong, H. P., Wan, C. C. & Wang, Y. Y., May 2002, In: Journal of the Electrochemical Society. 149, 5

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 13
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  8. Electrochemical impedance studies of methanol electro-oxidation on Pt/C thin film electrode

    Hsing, I., Wang, X. & Leng, Y., May 2002, In: Journal of the Electrochemical Society. 149, 5

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 180
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  9. Polyol electroless and electrodeposition of nanostructured Ni-Co films and powders

    Blackwood, D. J., Li, Y. Y. & Chow, G. M., Mar 2002, In: Journal of the Electrochemical Society. 149, 3

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 7
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  10. 2001
  11. Published

    Preparation of Thin Dielectric Film for Nonvolatile Memory by Thermal Oxidation of Si-Rich LPCVD Nitride

    Wong, H., Poon, M. C., Gao, Y. & Kok, T. C. W., May 2001, In: Journal of the Electrochemical Society. 148, 5

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 52
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  12. 2000
  13. Published

    Numerical solution of cathodic protection systems with nonlinear polarization curves

    Sun, W. & Liu, K. M., Oct 2000, In: Journal of the Electrochemical Society. 147, 10, p. 3687-3690

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 8
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  14. 1999

  15. Low-Pressure Etching of Nanostructures and Via Holes Using an Inductively Coupled Plasma System

    Berg, E. W. & Pang, S. W., 1999, In: Journal of the Electrochemical Society. 146, 2, p. 775-779

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 25
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  16. Published

    Study of Excess Silicon at Si3N4/Thermal SiO2 Interface Using EELS and Ellipsometric Measurements

    Gritsenko, V. A., Svitasheva, S. N., Petrenko, I. P., Wong, H., Xu, J. B. & Wilson, I. H., 1999, In: Journal of the Electrochemical Society. 146, 2, p. 780-785

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 22
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  17. 1998

  18. The corrosion of Mo-Al alloys in a H2/H2S/H2O gas mixture at 800-1000°C

    Kai, W. & Bai, C. Y., Jul 1998, In: Journal of the Electrochemical Society. 145, 7, p. 2265-2275

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 2
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  19. Published

    Determination of the trap density in amorphous silicon by quasi-static capacitance-voltage measurements

    Fahrner, W. R., Löffler, S., Chan, Y., Kwong, S. & Man, K., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1786-1790

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 8
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  20. Dry etching of deep Si trenches for released resonators in a Cl 2 plasma

    Weigold, J. W., Juan, W. H. & Pang, S. W., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1767-1771

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 9
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  21. 1997
  22. Published

    Germanium thin film formation by low-pressure chemical vapor deposition

    Meng, Z., Jin, Z., Gururaj, B. A., Chu, P., Kwok, H. S. & Wong, M., Apr 1997, In: Journal of the Electrochemical Society. 144, 4, p. 1423-1429

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 19
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  23. 1995

  24. High aspect ratio deep via holes in InP etched using Cl2/Ar plasma

    Ko, K. K. & Pang, S. W., Nov 1995, In: Journal of the Electrochemical Society. 142, 11, p. 3945-3949

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 27
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  25. Electrical characterization and surface analysis of dry etch-induced damage on Si after etching in an ECR source

    Sung, K. T., Pang, S. W., Cole, M. W. & Pearce, N., Jan 1995, In: Journal of the Electrochemical Society. 142, 1, p. 206-211

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 28
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  26. 1994

  27. Determination of sub-parts per billion boron contamination in N+ Czochralski silicon substrates by SIMS

    Chu, P. K., Bleiler, R. J. & Metz, J. M., Dec 1994, In: Journal of the Electrochemical Society. 141, 12, p. 3453-3456

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 3
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  28. Surface damage on GaAs etched using a multipolar electron cyclotron resonance source

    Ko, K. K. & Pang, S. W., Jan 1994, In: Journal of the Electrochemical Society. 141, 1, p. 255-258

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 11
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  29. 1993

  30. Low temperature etching of silylated resist in oxygen plasma generated by an electron cyclotron resonance source

    Sung, K. T., Juan, W. H., Pang, S. W. & Horn, M. W., Dec 1993, In: Journal of the Electrochemical Society. 140, 12, p. 3620-3623

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 3
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