Journal of the Electrochemical Society

Journal of the Electrochemical Society

ISSNs: 0013-4651

Additional searchable ISSN (Electronic): 1945-7111

Electrochemical Society, Inc., United States

Scopus rating (2020): CiteScore 6.6 SJR 1.258 SNIP 0.988

Journal

Journal Metrics

Research Output

  1. 1998
  2. Published

    Determination of the trap density in amorphous silicon by quasi-static capacitance-voltage measurements

    Fahrner, W. R., Löffler, S., Chan, Y., Kwong, S. & Man, K., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1786-1790

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 5
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  3. Dry etching of deep Si trenches for released resonators in a Cl 2 plasma

    Weigold, J. W., Juan, W. H. & Pang, S. W., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1767-1771

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 9
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  4. 1997
  5. Published

    Germanium thin film formation by low-pressure chemical vapor deposition

    Meng, Z., Jin, Z., Gururaj, B. A., Chu, P., Kwok, H. S. & Wong, M., Apr 1997, In: Journal of the Electrochemical Society. 144, 4, p. 1423-1429

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 17
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  6. 1995
  7. High aspect ratio deep via holes in InP etched using Cl2/Ar plasma

    Ko, K. K. & Pang, S. W., Nov 1995, In: Journal of the Electrochemical Society. 142, 11, p. 3945-3949

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 26
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  8. Electrical characterization and surface analysis of dry etch-induced damage on Si after etching in an ECR source

    Sung, K. T., Pang, S. W., Cole, M. W. & Pearce, N., Jan 1995, In: Journal of the Electrochemical Society. 142, 1, p. 206-211

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 25
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  9. 1994
  10. Determination of sub-parts per billion boron contamination in N+ Czochralski silicon substrates by SIMS

    Chu, P. K., Bleiler, R. J. & Metz, J. M., Dec 1994, In: Journal of the Electrochemical Society. 141, 12, p. 3453-3456

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 3
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  11. Surface damage on GaAs etched using a multipolar electron cyclotron resonance source

    Ko, K. K. & Pang, S. W., Jan 1994, In: Journal of the Electrochemical Society. 141, 1, p. 255-258

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 9
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  12. 1993
  13. Low temperature etching of silylated resist in oxygen plasma generated by an electron cyclotron resonance source

    Sung, K. T., Juan, W. H., Pang, S. W. & Horn, M. W., Dec 1993, In: Journal of the Electrochemical Society. 140, 12, p. 3620-3623

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 3
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  14. 1992
  15. Selective Etching of Bilayer Photoresist Using a Multipolar Electron Cyclotron Resonance Source

    Sung, K. T. & Pang, S. W., Dec 1992, In: Journal of the Electrochemical Society. 139, 12, p. 3599-3602

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 3
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  16. 1991
  17. Published

    New design of anodic oxidation reactor for high-quality gate oxide preparation

    Hung, T. F., Wong, H., Cheng, Y. C. & Pun, C. K., Dec 1991, In: Journal of the Electrochemical Society. 138, 12, p. 3747-3750

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 18
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  18. 1989
  19. Process simulation model for silicon ion implantation in undoped, LEC-grown GaAs

    Bindal, A., Wang, K. L., Chang, S. J., Kallel, M. A. & Chu, P. K., Aug 1989, In: Journal of the Electrochemical Society. 136, 8, p. 2414-2420

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 2
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  20. 1988
  21. Interfacial reaction between Ni and MBE-Grown SiGe alloy

    Thompson, R. D., Tu, K. N., Angillelo, J., Delage, S. & lyer, S. S., Dec 1988, In: Journal of the Electrochemical Society. 135, 12, p. 3161-3163

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 60
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  22. SUBMICROMETER STRUCTURES FABRICATED BY MASKED ION BEAM LITHOGRAPHY AND DRY ETCHING.

    Pang, S. W., Goodhue, W. D. & Geis, M. W., Jun 1988, In: Journal of the Electrochemical Society. 135, 6, p. 1526-1529

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 1
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  23. 1986
  24. SURFACE DAMAGE ON GaAs INDUCED BY REACTIVE ION ETCHING AND SPUTTER ETCHING.

    Pang, S. W., Apr 1986, In: Journal of the Electrochemical Society. 133, 4, p. 784-787

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 115
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  25. 1985
  26. Carburization Mechanisms of High Chromium Alloys

    Ramanarayanan, T. A. & Srolovitz, D. J., Sep 1985, In: Journal of the Electrochemical Society. 132, 9, p. 2268-2274

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  27. 1984
  28. Published

    ZINC SELENIDE PHOTOELECTRODES. EFFICIENT RADIATIVE RECOMBINATION IN A STABLE PHOTOELECTROCHEMICAL CELL.

    Smiley, P. M., Biagioni, R. N. & Ellis, A. B., May 1984, In: Journal of the Electrochemical Society. 131, 5, p. 1068-1073

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 18
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  29. 1982
  30. ESCA and SIMS Studies of the Passive Film on Iron

    Bockris, J. O., Murphy, O. J., Cocke, D. L., Tjong, S. C. & Yeager, E., Jun 1982, In: Journal of the Electrochemical Society. 129, 6, p. 1276

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)Comment/debatepeer-review

    Scopus citations: 4
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  31. Published

    LUMINESCENT PHOTOELECTROCHEMICAL CELLS - 7. PHOTOLUMINESCENT AND ELECTROLUMINESCENT PROPERTIES OF CADMIUM SULFO-SELENIDE ELECTRODES.

    Streckert, H. H., Tong, J. R., Carpenter, M. K. & Ellis, A. B., Apr 1982, In: Journal of the Electrochemical Society. 129, 4, p. 772-780

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 32
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  32. Published

    Electron and Ion Spectroscopic Studies of the Passive Film on Iron-Chromium Alloys

    Tjong, S. C., Hoffman, R. W. & Yeager, E. B., 1982, In: Journal of the Electrochemical Society. 129, 8, p. 1662-1668 7 p.

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 66
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  33. 1981
  34. ESCA and SIMS Studies of the Passive Film on Iron

    Tjong, S. C. & Yeager, E., 1981, In: Journal of the Electrochemical Society. 128, 10, p. 2251-2254

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)Comment/debatepeer-review

    Scopus citations: 71
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