Journal of the Electrochemical Society

Journal of the Electrochemical Society

ISSNs: 0013-4651

Additional searchable ISSN (Electronic): 1945-7111

Electrochemical Society, Inc., United States

Scopus rating (2022): CiteScore 7.2 SJR 0.954 SNIP 0.9

Journal

Journal Metrics
81 - 100 out of 109Page size: 20

Research Output

  1. 2002

  2. Electrochemical impedance studies of methanol electro-oxidation on Pt/C thin film electrode

    Hsing, I., Wang, X. & Leng, Y., May 2002, In: Journal of the Electrochemical Society. 149, 5

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 173
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  3. Polyol electroless and electrodeposition of nanostructured Ni-Co films and powders

    Blackwood, D. J., Li, Y. Y. & Chow, G. M., Mar 2002, In: Journal of the Electrochemical Society. 149, 3

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 7
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  4. 2001
  5. Published

    Preparation of Thin Dielectric Film for Nonvolatile Memory by Thermal Oxidation of Si-Rich LPCVD Nitride

    Wong, H., Poon, M. C., Gao, Y. & Kok, T. C. W., May 2001, In: Journal of the Electrochemical Society. 148, 5

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 52
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  6. 2000
  7. Published

    Numerical solution of cathodic protection systems with nonlinear polarization curves

    Sun, W. & Liu, K. M., Oct 2000, In: Journal of the Electrochemical Society. 147, 10, p. 3687-3690

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 8
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  8. 1999

  9. Low-Pressure Etching of Nanostructures and Via Holes Using an Inductively Coupled Plasma System

    Berg, E. W. & Pang, S. W., 1999, In: Journal of the Electrochemical Society. 146, 2, p. 775-779

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 24
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  10. Published

    Study of Excess Silicon at Si3N4/Thermal SiO2 Interface Using EELS and Ellipsometric Measurements

    Gritsenko, V. A., Svitasheva, S. N., Petrenko, I. P., Wong, H., Xu, J. B. & Wilson, I. H., 1999, In: Journal of the Electrochemical Society. 146, 2, p. 780-785

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 22
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  11. 1998

  12. The corrosion of Mo-Al alloys in a H2/H2S/H2O gas mixture at 800-1000°C

    Kai, W. & Bai, C. Y., Jul 1998, In: Journal of the Electrochemical Society. 145, 7, p. 2265-2275

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 2
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  13. Published

    Determination of the trap density in amorphous silicon by quasi-static capacitance-voltage measurements

    Fahrner, W. R., Löffler, S., Chan, Y., Kwong, S. & Man, K., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1786-1790

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 8
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  14. Dry etching of deep Si trenches for released resonators in a Cl 2 plasma

    Weigold, J. W., Juan, W. H. & Pang, S. W., May 1998, In: Journal of the Electrochemical Society. 145, 5, p. 1767-1771

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 9
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  15. 1997
  16. Published

    Germanium thin film formation by low-pressure chemical vapor deposition

    Meng, Z., Jin, Z., Gururaj, B. A., Chu, P., Kwok, H. S. & Wong, M., Apr 1997, In: Journal of the Electrochemical Society. 144, 4, p. 1423-1429

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 17
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  17. 1995

  18. High aspect ratio deep via holes in InP etched using Cl2/Ar plasma

    Ko, K. K. & Pang, S. W., Nov 1995, In: Journal of the Electrochemical Society. 142, 11, p. 3945-3949

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 27
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  19. Electrical characterization and surface analysis of dry etch-induced damage on Si after etching in an ECR source

    Sung, K. T., Pang, S. W., Cole, M. W. & Pearce, N., Jan 1995, In: Journal of the Electrochemical Society. 142, 1, p. 206-211

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 28
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  20. 1994

  21. Determination of sub-parts per billion boron contamination in N+ Czochralski silicon substrates by SIMS

    Chu, P. K., Bleiler, R. J. & Metz, J. M., Dec 1994, In: Journal of the Electrochemical Society. 141, 12, p. 3453-3456

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 3
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  22. Surface damage on GaAs etched using a multipolar electron cyclotron resonance source

    Ko, K. K. & Pang, S. W., Jan 1994, In: Journal of the Electrochemical Society. 141, 1, p. 255-258

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 11
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  23. 1993

  24. Low temperature etching of silylated resist in oxygen plasma generated by an electron cyclotron resonance source

    Sung, K. T., Juan, W. H., Pang, S. W. & Horn, M. W., Dec 1993, In: Journal of the Electrochemical Society. 140, 12, p. 3620-3623

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 3
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  25. 1992

  26. Selective Etching of Bilayer Photoresist Using a Multipolar Electron Cyclotron Resonance Source

    Sung, K. T. & Pang, S. W., Dec 1992, In: Journal of the Electrochemical Society. 139, 12, p. 3599-3602

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 3
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  27. 1991
  28. Published

    New design of anodic oxidation reactor for high-quality gate oxide preparation

    Hung, T. F., Wong, H., Cheng, Y. C. & Pun, C. K., Dec 1991, In: Journal of the Electrochemical Society. 138, 12, p. 3747-3750

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 19
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  29. 1989

  30. Process simulation model for silicon ion implantation in undoped, LEC-grown GaAs

    Bindal, A., Wang, K. L., Chang, S. J., Kallel, M. A. & Chu, P. K., Aug 1989, In: Journal of the Electrochemical Society. 136, 8, p. 2414-2420

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 2
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  31. 1988

  32. Interfacial reaction between Ni and MBE-Grown SiGe alloy

    Thompson, R. D., Tu, K. N., Angillelo, J., Delage, S. & lyer, S. S., Dec 1988, In: Journal of the Electrochemical Society. 135, 12, p. 3161-3163

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 61
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  33. SUBMICROMETER STRUCTURES FABRICATED BY MASKED ION BEAM LITHOGRAPHY AND DRY ETCHING.

    Pang, S. W., Goodhue, W. D. & Geis, M. W., Jun 1988, In: Journal of the Electrochemical Society. 135, 6, p. 1526-1529

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 2
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