Journal of Applied Physics

Journal of Applied Physics

ISSNs: 0021-8979

Additional searchable ISSN (electronic): 1089-7550

AMER INST PHYSICS, United States

Scopus rating (2023): CiteScore 5.4 SJR 0.649 SNIP 0.96

Journal

Journal Metrics
601 - 620 out of 636Page size: 20

Research Output

  1. 1982

  2. Formation of shallow silicide contacts of high Schottky barrier on Si: Alloying Pd and Pt with W versus alloying Pd and Pt with Si

    Eizenberg, M. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 3, p. 1577-1585

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 44
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  3. Growth kinetics of planar binary diffusion couples: "Thin-film case" versus "bulk cases"

    Gösele, U. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 4, p. 3252-3260

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 509
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  4. High-sensitivity silicide films for optical recording

    Ahn, K. Y., Distefano, T. H., Herd, S. R., Mazzeo, N. J. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 9, p. 6360-6364

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 6
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  5. Ion-beam-induced metastable Pt2Si3 phase. III. Structure and diffusion in amorphous Pt2Si3

    Graczyk, J. F., Tu, K. N., Tsaur, B. Y. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 10, p. 6772-6780

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 5
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  6. Laser writing on metal-silicon bilayers for optical storage. I. Optical properties

    Ahn, K. Y., Di Stefano, T. H., Mazzeo, N. J., Herd, S. R. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 5, p. 3777-3783

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 14
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  7. Laser writing on silicon-metal bilayers for optical storage. II. Microscopic study

    Herd, S. R., Tu, K. N., Ahn, K. Y., Di Stefano, T. H. & Mazzeo, N. J., 1982, In: Journal of Applied Physics. 53, 6, p. 4372-4378

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 9
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  8. NiSi formation at the silicide/Si interface on the NiPt/Si system

    Ottaviani, G., Tu, K. N., Chu, W. K., Hung, L. S. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 7, p. 4903-4906

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 40
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  9. Redistribution of As during Pd2Si formation: Ion channeling measurements

    Wittmer, M., Ting, C. Y., Ohdomari, I. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6781-6787

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 37
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  10. Schottky barrier of nonuniform contacts to n-type and p-type silicon

    Thompson, R. D. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 6, p. 4285-4288

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 22
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  11. Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions

    Tu, K. N., Ottaviani, G., Thompson, R. D. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 6, p. 4406-4410

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 89
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  12. Thermal stability of Pd2Si and PdSi in thin film and in bulk diffusion couples

    Tu, K. N., 1982, In: Journal of Applied Physics. 53, 1, p. 428-432

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 29
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  13. Titanium-tungsten contacts to Si: The effects of alloying on Schottky contact and on silicide formation

    Babcock, S. E. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6898-6905

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 53
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  14. 1981

  15. Cross-sectional transmission electron microscopy of silicon-silicide interfaces

    Föll, F., Ho, P. S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 250-255

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 115
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  16. Formation of shallow Schottky contacts to Si using Pt-Si and Pd-Si alloy films

    Eizenberg, M., Foell, H. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 2, p. 861-868

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 37
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  17. Schottky contacts of Gd-Pt and Gd-V alloys on n-Si and p-Si

    Thompson, R., Eizenberg, M. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 11, p. 6763-6768

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 30
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  18. Thin palladium silicide contacts to silicon

    Kritzinger, S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 305-310

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 25
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  19. 1980

  20. Ion-beam induced metastable Pt2Si3 phase. I. Formation, structure, and properties

    Tsaur, B. Y., Mayer, J. W. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 10, p. 5326-5333

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 57
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  21. Ion-beam-induced metastable Pt2Si3 phase. II. Kinetics and morphology

    Tsaur, B. Y., Mayer, J. W., Graczyk, J. F. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 10, p. 5334-5341

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 23
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  22. Parallel silicide contacts

    Ohdomari, I. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 7, p. 3735-3739

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 197
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  23. Shallow silicide contact

    Tu, K. N., Hammer, W. N. & Olowolafe, J. O., 1980, In: Journal of Applied Physics. 51, 3, p. 1663-1668

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 75
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