Journal of Applied Physics

Journal of Applied Physics

ISSNs: 0021-8979

Additional searchable ISSN (electronic): 1089-7550

AMER INST PHYSICS, United States

Scopus rating (2023): CiteScore 5.4 SJR 0.649 SNIP 0.96

Journal

Journal Metrics

Research Output

  1. 1983
  2. Temperature dependence of structural and electrical properties of Ta-Si thin alloy films

    Tien, T., Ottaviani, G. & Tu, K. N., 1983, In: Journal of Applied Physics. 54, 12, p. 7047-7057

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 30
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  3. 1982
  4. A simple analysis of inert marker motion in a single compound layer for solid-phase epitaxy and for binary diffusion couples

    Gösele, U., Tu, K. N. & Thompson, R. D., 1982, In: Journal of Applied Physics. 53, 12, p. 8759-8764

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 12
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  5. A study of vanadium as diffusion barrier between aluminum and gadolinium silicide contacts

    Eizenberg, M., Thompson, R. D. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6891-6897

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 30
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  6. Formation and Schottky behavior of manganese silicides on n-type silicon

    Eizenberg, M. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6885-6890

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 95
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  7. Formation of shallow silicide contacts of high Schottky barrier on Si: Alloying Pd and Pt with W versus alloying Pd and Pt with Si

    Eizenberg, M. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 3, p. 1577-1585

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 44
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  8. Growth kinetics of planar binary diffusion couples: "Thin-film case" versus "bulk cases"

    Gösele, U. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 4, p. 3252-3260

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 510
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  9. High-sensitivity silicide films for optical recording

    Ahn, K. Y., Distefano, T. H., Herd, S. R., Mazzeo, N. J. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 9, p. 6360-6364

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 6
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  10. Ion-beam-induced metastable Pt2Si3 phase. III. Structure and diffusion in amorphous Pt2Si3

    Graczyk, J. F., Tu, K. N., Tsaur, B. Y. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 10, p. 6772-6780

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 5
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  11. Laser writing on metal-silicon bilayers for optical storage. I. Optical properties

    Ahn, K. Y., Di Stefano, T. H., Mazzeo, N. J., Herd, S. R. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 5, p. 3777-3783

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 14
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  12. Laser writing on silicon-metal bilayers for optical storage. II. Microscopic study

    Herd, S. R., Tu, K. N., Ahn, K. Y., Di Stefano, T. H. & Mazzeo, N. J., 1982, In: Journal of Applied Physics. 53, 6, p. 4372-4378

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 9
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  13. NiSi formation at the silicide/Si interface on the NiPt/Si system

    Ottaviani, G., Tu, K. N., Chu, W. K., Hung, L. S. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 7, p. 4903-4906

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 39
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  14. Redistribution of As during Pd2Si formation: Ion channeling measurements

    Wittmer, M., Ting, C. Y., Ohdomari, I. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6781-6787

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 37
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  15. Schottky barrier of nonuniform contacts to n-type and p-type silicon

    Thompson, R. D. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 6, p. 4285-4288

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 22
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  16. Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions

    Tu, K. N., Ottaviani, G., Thompson, R. D. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 6, p. 4406-4410

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 88
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  17. Thermal stability of Pd2Si and PdSi in thin film and in bulk diffusion couples

    Tu, K. N., 1982, In: Journal of Applied Physics. 53, 1, p. 428-432

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 28
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  18. Titanium-tungsten contacts to Si: The effects of alloying on Schottky contact and on silicide formation

    Babcock, S. E. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6898-6905

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 53
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  19. 1981
  20. Cross-sectional transmission electron microscopy of silicon-silicide interfaces

    Föll, F., Ho, P. S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 250-255

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 115
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  21. Formation of shallow Schottky contacts to Si using Pt-Si and Pd-Si alloy films

    Eizenberg, M., Foell, H. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 2, p. 861-868

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 37
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  22. Schottky contacts of Gd-Pt and Gd-V alloys on n-Si and p-Si

    Thompson, R., Eizenberg, M. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 11, p. 6763-6768

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 30
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  23. Thin palladium silicide contacts to silicon

    Kritzinger, S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 305-310

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 25
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