Journal of Applied Physics

Journal of Applied Physics

ISSNs: 0021-8979

Additional searchable ISSN (Electronic): 1089-7550

AMER INST PHYSICS, United States

Scopus rating (2021): CiteScore 4.7 SJR 0.668 SNIP 0.964

Journal

Journal Metrics
541 - 560 out of 615Page size: 20

Research Output

  1. 1987

  2. In situ resistivity measurement of cobalt silicide formation

    Ottaviani, G., Tu, K. N., Psaras, P. & Nobili, C., 1987, In: Journal of Applied Physics. 62, 6, p. 2290-2294

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 28
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  3. Interfacial interactions of evaporated iridium thin films with (100) GaAs

    Yu, K. M., Sands, T., Jaklevic, J. M. & Haller, E. E., 1987, In: Journal of Applied Physics. 62, 5, p. 1815-1820

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 9
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  4. Lattice imaging of metastable TiSi2

    Chou, T. C., Wong, C. Y. & Tu, K. N., 1987, In: Journal of Applied Physics. 62, 6, p. 2275-2279

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 57
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  5. Localized epitaxial growth of ReSi2 on (111) and (001) silicon

    Chu, J. J., Chen, L. J. & Tu, K. N., 1987, In: Journal of Applied Physics. 62, 2, p. 461-465

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 24
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  6. Silicided shallow junction formation by ion implantation of impurity ions into silicide layers and subsequent drive-in

    Kwong, D. L., Ku, Y. H., Lee, S. K., Louis, E., Alvi, N. S. & Chu, P., 1987, In: Journal of Applied Physics. 61, 11, p. 5084-5088

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 55
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  7. 1986

  8. Morphology and kinetics of crystallization of amorphous V75Si25 thin-alloy films

    Nava, F., Weiss, B. Z., Tu, K. N., Smith, D. A. & Psaras, P. A., 1 Oct 1986, In: Journal of Applied Physics. 60, 7, p. 2445-2452

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 16
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  9. Surface segregation during deposition

    Eykholt, R. & Srolovitz, D. J., 1 Sep 1986, In: Journal of Applied Physics. 60, 5, p. 1793-1796

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 5
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  10. Capillary instabilities in thin films. I. Energetics

    Srolovitz, D. J. & Safran, S. A., 1 Jul 1986, In: Journal of Applied Physics. 60, 1, p. 247-254

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 275
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  11. Capillary instabilities in thin films. II. Kinetics

    Srolovitz, D. J. & Safran, S. A., 1 Jul 1986, In: Journal of Applied Physics. 60, 1, p. 255-260

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 220
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  12. Atom and acceptor depth distributions for aluminum channeled in silicon as a function of ion energy and crystal orientation

    Wilson, R. G., Jamba, D. M., Chu, P. K., Hopkins, C. G. & Hitzman, C. J., 1986, In: Journal of Applied Physics. 60, 8, p. 2806-2809

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 4
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  13. Effect of temperature on electrical and microstructural changes of coevaporated Ir-Si alloy films

    Weiss, B. Z., Tu, K. N. & Smith, D. A., 1986, In: Journal of Applied Physics. 59, 2, p. 415-423

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 18
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  14. Phase transformations in alloy and bilayer thin films of vanadium and silicon

    Nava, F., Psaras, P. A., Takai, H. & Tu, K. N., 1986, In: Journal of Applied Physics. 59, 7, p. 2429-2438

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 17
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  15. Schottky barrier degradation of the W/GaAs system after high-temperature annealing

    Yu, K. M., Cheung, S. K., Sands, T., Jaklevic, J. M., Cheung, N. W. & Haller, E. E., 1986, In: Journal of Applied Physics. 60, 9, p. 3235-3242

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 35
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  16. Stability of oxides grown on tantalum silicide surfaces

    Cros, A. & Tu, K. N., 1986, In: Journal of Applied Physics. 60, 9, p. 3323-3326

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 25
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  17. Titanium-tungsten contacts to silicon. II. Stability against aluminum penetration

    Babcock, S. E. & Tu, K. N., 1986, In: Journal of Applied Physics. 59, 5, p. 1599-1605

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 18
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  18. 1985

  19. Effects of substrate crystallinity and dopant on the growth kinetics of platinum silicides

    Takai, H., Psaras, P. A. & Tu, K. N., 1985, In: Journal of Applied Physics. 58, 11, p. 4165-4171

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 20
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  20. Phase transformations of alloys on a reactive substrate: Interaction of binary alloys of transition and rare-earth metals with silicon

    Thompson, R. D., Tu, K. N. & Ottaviani, G., 1985, In: Journal of Applied Physics. 58, 2, p. 705-710

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 25
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  21. Rapid thermal annealing of dopants implanted into preamorphized silicon

    Seidel, T. E., Knoell, R., Poli, G., Schwartz, B., Stevie, F. A. & Chu, P., 1985, In: Journal of Applied Physics. 58, 2, p. 683-687

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 29
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  22. Room-temperature oxidation of Ni, Pd, and Pt silicides

    Cros, A., Pollak, R. A. & Tu, K. N., 1985, In: Journal of Applied Physics. 57, 6, p. 2253-2257

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 19
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  23. Temperature dependence of semiconducting and structural properties of Cr-Si thin films

    Nava, F., Tien, T. & Tu, K. N., 1985, In: Journal of Applied Physics. 57, 6, p. 2018-2025

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

    Scopus citations: 73
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