Journal of Applied Physics

Journal of Applied Physics

ISSNs: 0021-8979

Additional searchable ISSN (electronic): 1089-7550

AMER INST PHYSICS, United States

Scopus rating (2023): CiteScore 5.4 SJR 0.649 SNIP 0.96

Journal

Journal Metrics

Research Output

  1. 1991
  2. Lattice location of diffused Zn atoms in GaAs and InP single crystals

    Chan, L. Y., Yu, K. M., Ben-Tzur, M., Haller, E. E., Jaklevic, J. M., Walukiewicz, W. & Hanson, C. M., 1991, In: Journal of Applied Physics. 69, 5, p. 2998-3006

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 34
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  3. Oxidation and reduction of copper oxide thin films

    Li, J., Vizkelethy, G., Revesz, P., Mayer, J. W. & Tu, K. N., 1991, In: Journal of Applied Physics. 69, 2, p. 1020-1029

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 146
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  4. The antiferromagnetic form factor of La2NiO4

    Wang, X. L., Stassis, C., Johnston, D. C., Leung, T. C., Ye, J., Harmon, B. N., Lander, G. H., & 3 othersSchultz, A. J., Loong, C. K. & Honig, J. M., 1991, In: Journal of Applied Physics. 69, 8, p. 4860-4862

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 10
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  5. 1990
  6. Antiferromagnetic form factor of Sr2CuO2Cl2

    Wang, X. L., Miller, L. L., Ye, J., Stassis, C., Harmon, B. N., Johnston, D. C., Schultz, A. J., & 1 othersLoong, C., 1 May 1990, In: Journal of Applied Physics. 67, 9, p. 4524-4526

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 12
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  7. Crosshatched surface morphology in strained III-V semiconductor films

    Chang, K. H., Gilbala, R., Srolovitz, D. J., Bhattacharya, P. K. & Mansfield, J. F., 1 May 1990, In: Journal of Applied Physics. 67, 9, p. 4093-4098

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 116
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  8. Explosive silicidation in nickel/amorphous-silicon multilayer thin films

    Clevenger, L. A., Thompson, C. V. & Tu, K. N., 1990, In: Journal of Applied Physics. 67, 6, p. 2894-2898

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 81
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  9. Formation, oxidation, electronic, and electrical properties of copper silicides

    Cros, A., Aboelfotoh, M. O. & Tu, K. N., 1990, In: Journal of Applied Physics. 67, 7, p. 3328-3336

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 200
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  10. Gate dielectric-dependent flicker noise in metal-oxide-semiconductor transistors

    Wong, H. & Cheng, Y. C., 1990, In: Journal of Applied Physics. 67, 2, p. 863-867

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 15
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  11. Instabilities of metal-oxide-semiconductor transistor with high-temperature annealing of its gate oxide in ammonia

    Wong, H. & Cheng, Y. C., 1990, In: Journal of Applied Physics. 67, 11, p. 7132-7138

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 24
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  12. Kinetic description of the transition from a one-phase to a two-phase growth regime in Al/Pd lateral diffusion couples

    Blanpain, B., Mayer, J. W., Liu, J. C. & Tu, K. N., 1990, In: Journal of Applied Physics. 68, 7, p. 3259-3267

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 14
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  13. Surface-related low-frequency noise of sputtered copper film

    Wong, H., Cheng, Y. C. & Ruan, G., 1990, In: Journal of Applied Physics. 67, 1, p. 312-316

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 9
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  14. 1989
  15. The dynamics of free, straight dislocation pairs. II. Edge dislocations

    Eykholt, R. & Srolovitz, D. J., 1 Jun 1989, In: Journal of Applied Physics. 65, 11, p. 4204-4211

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 5
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  16. The dynamics of free, straight dislocation pairs. I. Screw dislocations

    Eykholt, R., Trugman, S. A. & Srolovitz, D. J., 1 Jun 1989, In: Journal of Applied Physics. 65, 11, p. 4198-4203

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 4
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  17. "Critical thickness" of amorphous phase formation in binary diffusion couples

    Gösele, U. & Tu, K. N., 1989, In: Journal of Applied Physics. 66, 6, p. 2619-2626

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 126
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  18. The characterization of high-frequency ultrasonic fields using a polarimetric optical fiber sensor

    Chan, H. L. W., Chiang, K. S., Price, D. C. & Gardner, J. L., 1989, In: Journal of Applied Physics. 66, 4, p. 1565-1570

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 22
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  19. 1988
  20. A new growth model of thin silicon oxide in dry oxygen

    Wong, H. & Cheng, Y. C., 1988, In: Journal of Applied Physics. 64, 2, p. 893-897

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 9
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  21. High-temperature annealing characteristics of tungsten and tungsten nitride Schottky contacts to GaAs under different annealing conditions

    Yu, K. M., Jaklevic, J. M., Haller, E. E., Cheung, S. K. & Kwok, S. P., 1988, In: Journal of Applied Physics. 64, 3, p. 1284-1291

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 27
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  22. Localized epitaxial growth of IrSi3 on (111) and (001) silicon

    Chu, J. J., Chen, L. J. & Tu, K. N., 1988, In: Journal of Applied Physics. 63, 4, p. 1163-1167

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 15
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  23. Secondary grain growth and formation of antiphase domains in ordered Cu3Au thin films

    Chou, T. C. & Tu, K. N., 1988, In: Journal of Applied Physics. 64, 5, p. 2375-2379

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 4
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  24. Thermal stability and electrical conduction behavior of coevaporated WSi2±x thin films

    Nava, F., Weiss, B. Z., Ahn, K. Y., Smith, D. A. & Tu, K. N., 1988, In: Journal of Applied Physics. 64, 1, p. 354-364

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 38
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