Journal of Applied Physics

Journal of Applied Physics

ISSNs: 0021-8979

Additional searchable ISSN (electronic): 1089-7550

AMER INST PHYSICS, United States

Scopus rating (2023): CiteScore 5.4 SJR 0.649 SNIP 0.96

Journal

Journal Metrics

Research Output

  1. 1982
  2. Laser writing on silicon-metal bilayers for optical storage. II. Microscopic study

    Herd, S. R., Tu, K. N., Ahn, K. Y., Di Stefano, T. H. & Mazzeo, N. J., 1982, In: Journal of Applied Physics. 53, 6, p. 4372-4378

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 9
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  3. NiSi formation at the silicide/Si interface on the NiPt/Si system

    Ottaviani, G., Tu, K. N., Chu, W. K., Hung, L. S. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 7, p. 4903-4906

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 39
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  4. Redistribution of As during Pd2Si formation: Ion channeling measurements

    Wittmer, M., Ting, C. Y., Ohdomari, I. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6781-6787

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 37
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  5. Schottky barrier of nonuniform contacts to n-type and p-type silicon

    Thompson, R. D. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 6, p. 4285-4288

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 22
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  6. Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions

    Tu, K. N., Ottaviani, G., Thompson, R. D. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 6, p. 4406-4410

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 88
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  7. Thermal stability of Pd2Si and PdSi in thin film and in bulk diffusion couples

    Tu, K. N., 1982, In: Journal of Applied Physics. 53, 1, p. 428-432

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 28
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  8. Titanium-tungsten contacts to Si: The effects of alloying on Schottky contact and on silicide formation

    Babcock, S. E. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6898-6905

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 53
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  9. 1981
  10. Cross-sectional transmission electron microscopy of silicon-silicide interfaces

    Föll, F., Ho, P. S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 250-255

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 115
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  11. Formation of shallow Schottky contacts to Si using Pt-Si and Pd-Si alloy films

    Eizenberg, M., Foell, H. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 2, p. 861-868

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 37
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  12. Schottky contacts of Gd-Pt and Gd-V alloys on n-Si and p-Si

    Thompson, R., Eizenberg, M. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 11, p. 6763-6768

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 30
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  13. Thin palladium silicide contacts to silicon

    Kritzinger, S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 305-310

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 25
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  14. 1980
  15. Ion-beam induced metastable Pt2Si3 phase. I. Formation, structure, and properties

    Tsaur, B. Y., Mayer, J. W. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 10, p. 5326-5333

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 56
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  16. Ion-beam-induced metastable Pt2Si3 phase. II. Kinetics and morphology

    Tsaur, B. Y., Mayer, J. W., Graczyk, J. F. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 10, p. 5334-5341

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 23
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  17. Parallel silicide contacts

    Ohdomari, I. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 7, p. 3735-3739

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 197
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  18. Shallow silicide contact

    Tu, K. N., Hammer, W. N. & Olowolafe, J. O., 1980, In: Journal of Applied Physics. 51, 3, p. 1663-1668

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 75
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  19. 1979
  20. Contact reaction between Si and Pd-W alloy films

    Olowolafe, J. O., Tu, K. N. & Angilello, J., 1979, In: Journal of Applied Physics. 50, 10, p. 6316-6320

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 56
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  21. Microstructure and Schottky barrier height of iridium silicides formed on silicon

    Ohdomari, I., Kuan, T. S. & Tu, K. N., 1979, In: Journal of Applied Physics. 50, 11, p. 7020-7029

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 101
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  22. Silicide formation with Pd-V alloys and bilayers

    Mayer, J. W., Lau, S. S. & Tu, K. N., 1979, In: Journal of Applied Physics. 50, 9, p. 5855-5859

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 59
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  23. Surface electrical breakdown of tin oxide coated glass

    Jolly, D. C. & Chu, S. T., 1979, In: Journal of Applied Physics. 50, 10, p. 6196-6199

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 13
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  24. 1978
  25. Interactions in the Co/Si thin-film system. I. Kinetics

    Lau, S. S., Mayer, J. W. & Tu, K. N., 1978, In: Journal of Applied Physics. 49, 7, p. 4005-4010

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    Scopus citations: 177
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