Journal of Applied Physics
Journal of Applied Physics
ISSNs: 0021-8979
Additional searchable ISSN (electronic): 1089-7550
AMER INST PHYSICS, United States
Scopus rating (2023): CiteScore 5.4 SJR 0.649 SNIP 0.96
Journal
Research Output
- 1982
Laser writing on silicon-metal bilayers for optical storage. II. Microscopic study
Herd, S. R., Tu, K. N., Ahn, K. Y., Di Stefano, T. H. & Mazzeo, N. J., 1982, In: Journal of Applied Physics. 53, 6, p. 4372-4378Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 9NiSi formation at the silicide/Si interface on the NiPt/Si system
Ottaviani, G., Tu, K. N., Chu, W. K., Hung, L. S. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 7, p. 4903-4906Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 39Redistribution of As during Pd2Si formation: Ion channeling measurements
Wittmer, M., Ting, C. Y., Ohdomari, I. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6781-6787Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 37Schottky barrier of nonuniform contacts to n-type and p-type silicon
Thompson, R. D. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 6, p. 4285-4288Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 22Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions
Tu, K. N., Ottaviani, G., Thompson, R. D. & Mayer, J. W., 1982, In: Journal of Applied Physics. 53, 6, p. 4406-4410Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 88Thermal stability of Pd2Si and PdSi in thin film and in bulk diffusion couples
Tu, K. N., 1982, In: Journal of Applied Physics. 53, 1, p. 428-432Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 28Titanium-tungsten contacts to Si: The effects of alloying on Schottky contact and on silicide formation
Babcock, S. E. & Tu, K. N., 1982, In: Journal of Applied Physics. 53, 10, p. 6898-6905Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 53- 1981
Cross-sectional transmission electron microscopy of silicon-silicide interfaces
Föll, F., Ho, P. S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 250-255Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 115Formation of shallow Schottky contacts to Si using Pt-Si and Pd-Si alloy films
Eizenberg, M., Foell, H. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 2, p. 861-868Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 37Schottky contacts of Gd-Pt and Gd-V alloys on n-Si and p-Si
Thompson, R., Eizenberg, M. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 11, p. 6763-6768Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 30Thin palladium silicide contacts to silicon
Kritzinger, S. & Tu, K. N., 1981, In: Journal of Applied Physics. 52, 1, p. 305-310Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 25- 1980
Ion-beam induced metastable Pt2Si3 phase. I. Formation, structure, and properties
Tsaur, B. Y., Mayer, J. W. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 10, p. 5326-5333Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 56Ion-beam-induced metastable Pt2Si3 phase. II. Kinetics and morphology
Tsaur, B. Y., Mayer, J. W., Graczyk, J. F. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 10, p. 5334-5341Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 23Parallel silicide contacts
Ohdomari, I. & Tu, K. N., 1980, In: Journal of Applied Physics. 51, 7, p. 3735-3739Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 197Shallow silicide contact
Tu, K. N., Hammer, W. N. & Olowolafe, J. O., 1980, In: Journal of Applied Physics. 51, 3, p. 1663-1668Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 75- 1979
Contact reaction between Si and Pd-W alloy films
Olowolafe, J. O., Tu, K. N. & Angilello, J., 1979, In: Journal of Applied Physics. 50, 10, p. 6316-6320Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 56Microstructure and Schottky barrier height of iridium silicides formed on silicon
Ohdomari, I., Kuan, T. S. & Tu, K. N., 1979, In: Journal of Applied Physics. 50, 11, p. 7020-7029Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 101Silicide formation with Pd-V alloys and bilayers
Mayer, J. W., Lau, S. S. & Tu, K. N., 1979, In: Journal of Applied Physics. 50, 9, p. 5855-5859Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 59Surface electrical breakdown of tin oxide coated glass
Jolly, D. C. & Chu, S. T., 1979, In: Journal of Applied Physics. 50, 10, p. 6196-6199Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 13- 1978
Interactions in the Co/Si thin-film system. I. Kinetics
Lau, S. S., Mayer, J. W. & Tu, K. N., 1978, In: Journal of Applied Physics. 49, 7, p. 4005-4010Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 177