Journal of Applied Physics

Journal of Applied Physics

ISSNs: 0021-8979

Additional searchable ISSN (Electronic): 1089-7550

AMER INST PHYSICS, United States

Scopus rating (2018): CiteScore 2.33 SJR 0.746 SNIP 1.047

Journal

Journal Metrics
421 - 426 out of 426Page size: 20

Research Output

  1. 1986

  2. Capillary instabilities in thin films. I. Energetics

    Srolovitz, D. J. & Safran, S. A., 1 Jul 1986, In : Journal of Applied Physics. 60, 1, p. 247-254

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal

    Scopus citations: 251
    Check@CityULib

  3. Capillary instabilities in thin films. II. Kinetics

    Srolovitz, D. J. & Safran, S. A., 1 Jul 1986, In : Journal of Applied Physics. 60, 1, p. 255-260

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal

    Scopus citations: 190
    Check@CityULib

  4. Atom and acceptor depth distributions for aluminum channeled in silicon as a function of ion energy and crystal orientation

    Wilson, R. G., Jamba, D. M., Chu, P. K., Hopkins, C. G. & Hitzman, C. J., 1986, In : Journal of Applied Physics. 60, 8, p. 2806-2809

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal

    Scopus citations: 4
    Check@CityULib

  5. Schottky barrier degradation of the W/GaAs system after high-temperature annealing

    Yu, K. M., Cheung, S. K., Sands, T., Jaklevic, J. M., Cheung, N. W. & Haller, E. E., 1986, In : Journal of Applied Physics. 60, 9, p. 3235-3242

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal

    Scopus citations: 32
    Check@CityULib
  6. 1985

  7. Rapid thermal annealing of dopants implanted into preamorphized silicon

    Seidel, T. E., Knoell, R., Poli, G., Schwartz, B., Stevie, F. A. & Chu, P., 1985, In : Journal of Applied Physics. 58, 2, p. 683-687

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal

    Scopus citations: 28
    Check@CityULib
  8. 1983

  9. Damage induced in Si by ion milling or reactive ion etching

    Pang, S. W., Rathman, D. D., Silversmith, D. J., Mountain, R. W. & DeGraff, P. D., 1983, In : Journal of Applied Physics. 54, 6, p. 3272-3277

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal

    Scopus citations: 99
    Check@CityULib
Previous 1...18 19 20 21 22 Next