IEEE Transactions on Semiconductor Manufacturing

IEEE Transactions on Semiconductor Manufacturing

ISSNs: 0894-6507

Additional searchable ISSN (electronic): 1558-2345

Institute of Electrical and Electronics Engineers, United States

Scopus rating (2023): CiteScore 5.2 SJR 0.967 SNIP 1.237

Journal

Journal Metrics
1 - 17 out of 17Page size: 20

Research Output

  1. 2023
  2. Published

    Cross-chamber Data Transferability Evaluation for Fault Detection and Classification in Semiconductor Manufacturing

    Zhu, F., Jia, X., Li, W., Xie, M., Li, L. & Lee, J., Feb 2023, In: IEEE Transactions on Semiconductor Manufacturing. 36, 1, p. 68-77

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 3
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  3. 2017
  4. Published

    A hierarchical intelligent methodology for spatiotemporal control of wafer temperature in rapid thermal processing

    Zhang, X., Li, H., Wang, B. & Ma, S., 1 Feb 2017, In: IEEE Transactions on Semiconductor Manufacturing. 30, 1, p. 52-59 7590160.

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 9
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  5. 2011
  6. Published

    Detection of spatial defect patterns generated in semiconductor fabrication processes

    Yuan, T., Kuo, W. & Bae, S. J., Aug 2011, In: IEEE Transactions on Semiconductor Manufacturing. 24, 3, p. 392-403 5776703.

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 112
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  7. Published

    Modeling of integrated circuit yield using a spatial nonhomogeneous poisson process

    Hwang, J. Y., Kuo, W. & Ha, C., Aug 2011, In: IEEE Transactions on Semiconductor Manufacturing. 24, 3, p. 377-384 5752258.

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 5
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  8. 2010

  9. Statistical detection of defect patterns using hough transform

    Zhou, Q., Zeng, L. & Zhou, S., Aug 2010, In: IEEE Transactions on Semiconductor Manufacturing. 23, 3, p. 370-380 5453039.

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 12
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  10. 2009
  11. Published

    Accurate conjunction of yield models for fault-tolerant memory integrated circuits

    Ha, C., Kuo, W. & Hwang, J. Y., 2009, In: IEEE Transactions on Semiconductor Manufacturing. 22, 3, p. 344-350 5159401.

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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  12. 2008

  13. Fast lithography image simulation by exploiting symmetries in lithography systems

    Yu, P., Qiu, W. & Pan, D. Z., Nov 2008, In: IEEE Transactions on Semiconductor Manufacturing. 21, 4, p. 638-645 4657435.

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 8
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  14. 2006

  15. Multiblock Principal Component Analysis Based on a Combined Index for Semiconductor Fault Detection and Diagnosis

    Cherry, G. A. & Qin, S. J., May 2006, In: IEEE Transactions on Semiconductor Manufacturing. 19, 2, p. 159-172

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 186
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  16. 2005

  17. On the relationship of semiconductor yield and reliability

    Kim, K. O., Zuo, M. J. & Kuo, W., Aug 2005, In: IEEE Transactions on Semiconductor Manufacturing. 18, 3, p. 422-429

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 14
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  18. Recursive Least Squares Estimation for Run-to-Run Control With Metrology Delay and Its Application to STI Etch Process

    Wang, J., He, Q. P., Qin, S. J., Bode, C. A. & Purdy, M. A., May 2005, In: IEEE Transactions on Semiconductor Manufacturing. 18, 2, p. 309-319

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 53
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  19. 2003

  20. Computationally efficient modeling of wafer temperatures in a low-pressure chemical vapor deposition furnace

    He, Q., Qin, S. J. & Toprac, A. J., May 2003, In: IEEE Transactions on Semiconductor Manufacturing. 16, 2, p. 342-350

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 9
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  21. 2000

  22. Fault Detection of Plasma Etchers Using Optical Emission Spectra

    Yue, H. H., Qin, S. J., Markle, R. J., Nauert, C. & Gatto, M., Aug 2000, In: IEEE Transactions on Semiconductor Manufacturing. 13, 3, p. 374-385

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 112
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  23. 1999

  24. Modeling manufacturing yield and reliability

    Kim, T. & Kuo, W., 1999, In: IEEE Transactions on Semiconductor Manufacturing. 12, 4, p. 485-492

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 40
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  25. 1996

  26. A nonparametric approach to estimate system burn-in time

    Chien, W. K. & Kuo, W., 1996, In: IEEE Transactions on Semiconductor Manufacturing. 9, 3, p. 461-467

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 11
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  27. A queueing network model for semiconductor manufacturing

    Connors, D. P., Feigin, G. E. & Yao, D. D., 1996, In: IEEE Transactions on Semiconductor Manufacturing. 9, 3, p. 412-427

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 114
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  28. Methods for job configuration in semiconductor manufacturing

    Connors, D. P. & Yao, D. D., 1996, In: IEEE Transactions on Semiconductor Manufacturing. 9, 3, p. 401-411

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 7
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  29. Testing the robustness of two-boundary control policies in semiconductor manufacturing

    Yan, H., Lou, S., Sethi, S., Gardel, A. & Deosthali, P., 1996, In: IEEE Transactions on Semiconductor Manufacturing. 9, 2, p. 285-288

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 25
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