IEEE Transactions on Plasma Science

IEEE Transactions on Plasma Science

ISSNs: 0093-3813

Additional searchable ISSN (Electronic): 1939-9375

Institute of Electrical and Electronics Engineers, United States

Scopus rating (2021): CiteScore 2.6 SJR 0.479 SNIP 0.866

Journal

Journal Metrics

Research Output

  1. 1998
  2. Published

    Instrumental and process considerations for the fabrication of silicon-on-insulators (SOI) structures by plasma immersion ion implantation

    Chu, P. K., Qin, S., Chan, C., Cheung, N. W. & Ko, P. K., 1998, In: IEEE Transactions on Plasma Science. 26, 1, p. 79-84

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 48
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  3. Published

    Ion dose uniformity for planar sample plasma immersion ion implantation

    Kwok, D. T., Chu, P. K. & Chan, C., 1998, In: IEEE Transactions on Plasma Science. 26, 6, p. 1669-1679

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 30
    Check@CityULib
  4. Published

    Low pressure plasma immersion ion implantation of silicon

    Fan, Z., Chen, Q., Chu, P. K. & Chan, C., 1998, In: IEEE Transactions on Plasma Science. 26, 6, p. 1661-1668

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 18
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  5. Published

    Plasma-immersion ion implantation of the interior surface of a small cylindrical bore using an auxiliary electrode for finite rise-time voltage pulses

    Zeng, X., Kwok, T., Liu, A., Chu, P. K., Tang, B. & Sheridan, T. E., 1998, In: IEEE Transactions on Plasma Science. 26, 2, p. 175-180

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 20
    Check@CityULib
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