IEEE Electron Device Letters
IEEE Electron Device Letters
ISSNs: 0741-3106, 0193-8576
Additional searchable ISSN (electronic): 1558-0563
Institute of Electrical and Electronics Engineers, United States
Scopus rating (2023): CiteScore 8.2 SJR 1.25 SNIP 1.5
Journal
Research Output
- 2022
- Published
Acoustic Centrifugation Facilitating Particle Sensing in Liquid on a Piezoelectric Resonator
Qian, J., Begum, H. & Lee, J.E.-Y., May 2022, In: IEEE Electron Device Letters. 43, 5, p. 801-804 4 p.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 5 - 2020
- Published
Polymer Electret Improves the Performance of the Oxygen-Doped Organic Field-Effect Transistors
Li, D., Zhu, Y., Wei, P., Lu, W., Li, S., Wang, S. & Xu, B. B. & 1 others, , Nov 2020, In: IEEE Electron Device Letters. 41, 11, p. 1665-1668 9205215.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 8 - Published
Stable Hysteresis-Free MoS2 Transistors With Low-k/High-k Bilayer Gate Dielectrics
Zhang, Z., Su, M., Li, G., Wang, J., Zhang, X., Ho, J. C. & Wang, C. & 3 others, , Jul 2020, In: IEEE Electron Device Letters. 41, 7, p. 1036-1039Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 12 - Published
Equivalent Circuit of Quantum-Dot LED and Acquisition of Carrier Lifetime in Active Layer
Xiao, H., Wang, K., Wang, R., Chen, W. & Chiang, K. S., Jan 2020, In: IEEE Electron Device Letters. 41, 1, p. 87-90 8907889.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 10 - 2018
- Published
A Compact and Low-Loss Bandpass Filter Using Self-Coupled Folded-Line Resonator With Capacitive Feeding Technique
Hou, Z. J., Yang, Y., Zhu, X., Li, Y. C., Dutkiewicz, E. & Xue, Q., Oct 2018, In: IEEE Electron Device Letters. 39, 10, p. 1584-1587Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 43 - Published
Wideband Millimeter-Wave On-Chip Quadrature Coupler with Improved In-Band Flatness in 0.13-μm SiGe Technology
Hou, Z. J., Yang, Y., Chiu, L., Zhu, X. & Xue, Q., May 2018, In: IEEE Electron Device Letters. 39, 5, p. 652-655Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 16 - 2017
- Published
Compact On-Chip Bandpass Filter with Improved In-Band Flatness and Stopband Attenuation in 0.13-μm (Bi)-CMOS Technology
Yang, Y., Liu, H., Hou, Z. J., Zhu, X., Dutkiewicz, E. & Xue, Q., Oct 2017, In: IEEE Electron Device Letters. 38, 10, p. 1359-1362 8010269.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 64 - Published
Flexible Low-Power Organic Complementary Inverter Based on Low-k Polymer Dielectric
Liu, J., Gao, X., Xu, J.-L., Ruotolo, A. & Wang, S.-D., Oct 2017, In: IEEE Electron Device Letters. 38, 10, p. 1461-1464 8004420.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 5 - Published
An On-Chip Bandpass Filter Using a Broadside-Coupled Meander Line Resonator with a Defected-Ground Structure
Zhong, Y., Yang, Y., Zhu, X., Dutkiewicz, E., Shum, K. M. & Xue, Q., 1 May 2017, In: IEEE Electron Device Letters. 38, 5, p. 626-629 7891020.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 91 - 2016
- Published
Tungsten-Doped Nb2O5 Nanorod Sensor for Toxic and Combustible Gas Monitoring Applications
Yu, J., Cheung, K. W., Yan, W. H. & Ho, D., Sept 2016, In: IEEE Electron Device Letters. 37, 9, p. 1223-1226Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 5 - Published
A broadside-coupled meander-line resonator in 0.13-μm SiGe technology for millimeter-wave application
Chakraborty, S., Yang, Y., Zhu, X., Sevimli, O., Xue, Q., Esselle, K. & Heimlich, M., 1 Mar 2016, In: IEEE Electron Device Letters. 37, 3, p. 329-332 7390000.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 91 - 2013
- Published
A horseshoe micromachined resonant magnetic field sensor with high quality factor
Zhang, W. & Lee, J.E.-Y., Oct 2013, In: IEEE Electron Device Letters. 34, 10, p. 1310-1312 6595578.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 22 - Published
Stability and low-frequency noise in InAs NW parallel-array thin-film transistors
Wahl, R. E., Wang, F., Chung, H. E., Kunnen, G. R., Yip, S., Lee, E. H. & Pun, E. Y. B. & 3 others, , 2013, In: IEEE Electron Device Letters. 34, 6, p. 765-767 6515612.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 9 - 2012
- Published
Thermoelastic dissipation in etch-hole filled Lamé bulk-mode silicon microresonators
Tu, C. & Lee, J.E.-Y., Mar 2012, In: IEEE Electron Device Letters. 33, 3, p. 450-452 6144691.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 17 - Published
Reversed nonlinear oscillations in lamé-mode single-crystal-silicon microresonators
Zhu, H. & Lee, J.E.-Y., 2012, In: IEEE Electron Device Letters. 33, 10, p. 1492-1494 6291747.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 9 - 2011
- Published
Subthreshold characteristics of MOS transistors with CeO2La 2O3 stacked gate dielectric
Wong, H., Yang, B. L., Kakushima, K. & Iwai, H., Aug 2011, In: IEEE Electron Device Letters. 32, 8, p. 1002-1004 5898389.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 13 - 2010
- Published
Fermi-level pinning at metal/high-k interface influenced by electron state density of metal gate
Yang, Z. C., Huang, A. P., Zheng, X. H., Xiao, Z. S., Liu, X. Y., Zhang, X. W. & Chu, P. K. & 1 others, , Oct 2010, In: IEEE Electron Device Letters. 31, 10, p. 1101-1103 5560726.Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 13 - 1998
- Published
Fabrication of low dielectric constant materials for ULSI multilevel interconnection by plasma ion implantation
Qin, S., Zhou, Y., Chan, C. & Chu, P. K., Nov 1998, In: IEEE Electron Device Letters. 19, 11, p. 420-422Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Scopus citations: 10