Applied Physics Letters

Applied Physics Letters

ISSNs: 0003-6951

Additional searchable ISSN (electronic): 1077-3118

AMER INST PHYSICS, United States

Scopus rating (2023): CiteScore 6.4 SJR 0.976 SNIP 1.015

Journal

Journal Metrics
661 - 676 out of 676Page size: 20

Research Output

  1. 1981

  2. Low-temperature redistribution of As in Si during Pd2Si formation

    Ohdomari, I., Tu, K. N., Suguro, K., Akiyama, M., Kimura, I. & Yoneda, K., 1981, In: Applied Physics Letters. 38, 12, p. 1015-1017

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 50
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  3. Silicide films for archival optical storage

    Tu, K. N., Ahn, K. Y. & Herd, S. R., 1981, In: Applied Physics Letters. 39, 11, p. 927-929

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 12
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  4. 1980

  5. Effect of substrate temperature on the formation of shallow silicide contacts on Si using Pd-W and Pt-W alloys

    Eizenberg, M., Ottaviani, G. & Tu, K. N., 1980, In: Applied Physics Letters. 37, 1, p. 87-89

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 26
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  6. Phase separation in alloy-Si interaction

    Ottaviani, G., Tu, K. N., Mayer, J. W. & Tsaur, B. Y., 1980, In: Applied Physics Letters. 36, 4, p. 331-333

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 48
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  7. Shallow silicide contacts formed by using codeposited Pt2Si and Pt1.2Si films

    Eizenberg, M., Föll, H. & Tu, K. N., 1980, In: Applied Physics Letters. 37, 6, p. 547-549

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 15
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  8. Shallow silicide-to-silicon contacts: The case of amorphous-Pd 80Si20-to-silicon

    Kritzinger, S. & Tu, K. N., 1980, In: Applied Physics Letters. 37, 2, p. 205-208

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 9
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  9. 1978

  10. Identification of diffusion species in V-SiO2 reactions

    Chu, W. K. & Tu, K. N., 1978, In: Applied Physics Letters. 33, 1, p. 83-85

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 8
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  11. Schottky-barrier height of iridium silicide

    Ohdomari, I., Tu, K. N., D'Heurle, F. M., Kuan, T. S. & Petersson, S., 1978, In: Applied Physics Letters. 33, 12, p. 1028-1030

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 38
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  12. 1977

  13. A controlled-atmosphere electron-microscopy study of the influence of oxygen on the interdiffusion of gold and iron

    Cairns, J. A., Keep, C. W., Waite, R. J., Ziegler, J. F. & Tu, K. N., 1977, In: Applied Physics Letters. 30, 8, p. 392-394

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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  14. Effect of substrate temperature on the microstructure of thin-film silicide

    Köster, U., Tu, K. N. & Ho, P. S., 1977, In: Applied Physics Letters. 31, 9, p. 634-636

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 27
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  15. 1976

  16. Direct observations of defects in implanted and postannealed silicon wafers

    Glowinski, L. D., Tu, K. N. & Ho, P. S., 1976, In: Applied Physics Letters. 28, 6, p. 312-313

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 25
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  17. 1975

  18. Selective growth of metal-rich silicide of near-noble metals

    Tu, K. N., 1975, In: Applied Physics Letters. 27, 4, p. 221-224

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 241
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  19. 1974

  20. Identification of the dominant diffusing species in silicide formation

    Chu, W. K., Kraütle, H., Mayer, J. W., Müller, H., Nicolet, M. A. & Tu, K. N., 1974, In: Applied Physics Letters. 25, 8, p. 454-457

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 105
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  21. 1973

  22. Analysis of formation of hafnium silicide on silicon

    Kircher, C. J., Mayer, J. W., Tu, K. N. & Ziegler, J. F., 1973, In: Applied Physics Letters. 22, 2, p. 81-83

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 33
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  23. Circular etch pits in ion-implanted amorphous silicon films

    Tu, K. N., Tan, S. I. & Crowder, B. L., 1973, In: Applied Physics Letters. 22, 6, p. 274-275

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 4
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  24. Formation of vanadium silicides by the interactions of v with bare and oxidized Si wafers

    Tu, K. N., Ziegler, J. F. & Kircher, C. J., 1973, In: Applied Physics Letters. 23, 9, p. 493-495

    Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

    Scopus citations: 72
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