Applied Physics Letters

Applied Physics Letters

ISSNs: 0003-6951

Additional searchable ISSN (Electronic): 1077-3118

AMER INST PHYSICS, United States

Scopus rating (2021): CiteScore 6.6 SJR 1.025 SNIP 1.119

Journal

Journal Metrics

Research Output

  1. 1977
  2. A controlled-atmosphere electron-microscopy study of the influence of oxygen on the interdiffusion of gold and iron

    Cairns, J. A., Keep, C. W., Waite, R. J., Ziegler, J. F. & Tu, K. N., 1977, In: Applied Physics Letters. 30, 8, p. 392-394

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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  3. Effect of substrate temperature on the microstructure of thin-film silicide

    Köster, U., Tu, K. N. & Ho, P. S., 1977, In: Applied Physics Letters. 31, 9, p. 634-636

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 27
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  4. 1976
  5. Direct observations of defects in implanted and postannealed silicon wafers

    Glowinski, L. D., Tu, K. N. & Ho, P. S., 1976, In: Applied Physics Letters. 28, 6, p. 312-313

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 25
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  6. 1975
  7. Selective growth of metal-rich silicide of near-noble metals

    Tu, K. N., 1975, In: Applied Physics Letters. 27, 4, p. 221-224

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 236
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  8. 1974
  9. Identification of the dominant diffusing species in silicide formation

    Chu, W. K., Kraütle, H., Mayer, J. W., Müller, H., Nicolet, M. A. & Tu, K. N., 1974, In: Applied Physics Letters. 25, 8, p. 454-457

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 102
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  10. 1973
  11. Analysis of formation of hafnium silicide on silicon

    Kircher, C. J., Mayer, J. W., Tu, K. N. & Ziegler, J. F., 1973, In: Applied Physics Letters. 22, 2, p. 81-83

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 31
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  12. Circular etch pits in ion-implanted amorphous silicon films

    Tu, K. N., Tan, S. I. & Crowder, B. L., 1973, In: Applied Physics Letters. 22, 6, p. 274-275

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 4
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  13. Formation of vanadium silicides by the interactions of v with bare and oxidized Si wafers

    Tu, K. N., Ziegler, J. F. & Kircher, C. J., 1973, In: Applied Physics Letters. 23, 9, p. 493-495

    Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

    Scopus citations: 66
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