Applied Physics Letters
Applied Physics Letters
ISSNs: 0003-6951
Additional searchable ISSN (Electronic): 1077-3118
AMER INST PHYSICS, United States
Scopus rating (2021): CiteScore 6.6 SJR 1.025 SNIP 1.119
Journal
Research Output
- 1977
A controlled-atmosphere electron-microscopy study of the influence of oxygen on the interdiffusion of gold and iron
Cairns, J. A., Keep, C. W., Waite, R. J., Ziegler, J. F. & Tu, K. N., 1977, In: Applied Physics Letters. 30, 8, p. 392-394Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Effect of substrate temperature on the microstructure of thin-film silicide
Köster, U., Tu, K. N. & Ho, P. S., 1977, In: Applied Physics Letters. 31, 9, p. 634-636Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Scopus citations: 27- 1976
Direct observations of defects in implanted and postannealed silicon wafers
Glowinski, L. D., Tu, K. N. & Ho, P. S., 1976, In: Applied Physics Letters. 28, 6, p. 312-313Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Scopus citations: 25- 1975
Selective growth of metal-rich silicide of near-noble metals
Tu, K. N., 1975, In: Applied Physics Letters. 27, 4, p. 221-224Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Scopus citations: 236- 1974
Identification of the dominant diffusing species in silicide formation
Chu, W. K., Kraütle, H., Mayer, J. W., Müller, H., Nicolet, M. A. & Tu, K. N., 1974, In: Applied Physics Letters. 25, 8, p. 454-457Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Scopus citations: 102- 1973
Analysis of formation of hafnium silicide on silicon
Kircher, C. J., Mayer, J. W., Tu, K. N. & Ziegler, J. F., 1973, In: Applied Physics Letters. 22, 2, p. 81-83Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Scopus citations: 31Circular etch pits in ion-implanted amorphous silicon films
Tu, K. N., Tan, S. I. & Crowder, B. L., 1973, In: Applied Physics Letters. 22, 6, p. 274-275Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Scopus citations: 4Formation of vanadium silicides by the interactions of v with bare and oxidized Si wafers
Tu, K. N., Ziegler, J. F. & Kircher, C. J., 1973, In: Applied Physics Letters. 23, 9, p. 493-495Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Scopus citations: 66